Add to cart
Sale!
Dermaceutic Logo Product Page

Dermaceutic Mask 15

CHF 54.40 incl. 8.1% VAT

Oil Reducing Astringent Glycolic Mask
Oily, Acne-prone Skin

(8 customer reviews)
50ml

Ready to ship, delivery time 1-2 days

Purchase this product now and earn 272 Points!
Dermaceutic Mask 15
Dermaceutic Mask 15 CHF 68.00 CHF 54.40 incl. 8.1% VAT

Login to select 2 free samples + earn points

  • Free shipping on all orders over CHF 70.00
  • Order before 15h00 for same day dispatch
  • Purchase on invoice

Dermaceutic Mask 15 is a retexturing mask that removes dead cells and excess sebum from the skin while purifying and removing impurities. Recommended for oily skin and skin that is prone to acne.

Key ingredients include 15% Glycolic Acid, an alpha hydroxy acid (AHA) with a very small molecule that easily penetrates the skin. Its acidic pH accelerates exfoliation, while Bentonite a highly absorbent clay that is saturated in fat, enables it to remove toxins and impurities from tissue. Salicylic Acid 2% causes a keratolytic action which reduces intercorneocyte cohesion and removes dry, dead skin cells. Paraben-free. Fragrance-free.

Recommendation: With it’s unique combination of smectic clay and glycolic acid, this high percentage multi-tasking AHA mask purifies, helps to lighten superficial pigmentation, removes imperfections, tightens pores and reduces excess sebum. Your skin will be left with a matte appearance. Do not use during pregnancy or when breast-feeding and always use a high-factor broad spectrum during the day when using this product.


RESULT

The skin is purified, a matte appearance is restored, and pores are tightened.


INSTRUCTIONS FOR USE

Apply to the face in a thin, even layer, leave on skin for 2 to 4 minutes, then rinse off with water. Use once or twice a week.


ACTIVE INGREDIENTS

The unique combination of smectic clay and glycolic acid purifies and removes imperfections from the skin, tightens pores and reduces excess sebum.

Glycolic acid
One of the alpha hydroxy acids (“fruit acids”), this very small molecule penetrates the skin easily. Its acidic pH accelerates exfoliation by destroying the links that bind dead cells together.

Bentonite
Highly absorbent clay that is saturated in fat, which enables it to remove toxins and impurities from tissue.

Salicylic acid
Causes a keratolytic action that reduces intercorneocyte cohesion and destroys lipids that bind the outer cells of the epidermis.

8 reviews for Dermaceutic Mask 15

  1. French

    Andreea (verified owner)

    Super mask. J’ai fait un peeling dans une clinique esthétique très réputée en Suisse et ils utilisent ces produits. Elle a fait un peeling à base d’acide glycolique comme ce mask. Il ferme les portes, il laisse la peau et enlève les impuretés. Plus de boutons. Vraiment un masque efficace. A ne pas laisser plus de 2 min.

  2. German

    Mirela (verified owner)

    ist nichts für sensible haut ziemlich stark

  3. French

    Sarah

    Masque très efficace 1x/semaine en complément du Foamer 15 quotidien. Traitement professionnel à domicile idéal pour peau grasse,

  4. German

    Jeannine (verified owner)

    Die Maske ist sehr effizient. Allerdings kann ich sie nicht 2 x wöchentlich anwenden. Das ist zu viel für meine sensible Haut.

  5. German

    Bruno

    Endlich eine Maske wo funzionerete auf die Haut ! Kann nur empfehlen aber nicht auf empfindlichen Haut das Zeug prickelnd!!
    Echt sehr starkes Produkt!!!
    Meine Haut ist danach sauber feinporig und ja .. perfekt

  6. German

    Alyssa

    Nichts für sensible Haut. Bei mir ist alles komplett angeschwollen….

  7. EN

    Veronique (verified owner)

    Masque parfait lorsque j ai des périodes où mon acné réapparaît. Je le fais une fois par semaine.

  8. German

    Maya Baumgartner (verified owner)

    I started to use this mask two weeks ago. Since I have a sensitive skin I only leave it on my face for a few minutes. I to now no problem and like the results. My face is clearer and my pores smaller.

Show only reviews in EN (1)

Add a review

Your email address will not be published. Required fields are marked *